WO2025117715 - ELECTROSTATIC CHUCK WITH CONTROLLABLE TEMPERATURE, ION IMPLANTATION SYSTEM USING THE SAME AS WELL AS METHOD OF CONTROLLING THE TEMPERATURE IN SAID ELECTROSTATIC CHUCK
National phase entry is expected:
Publication Number
WO/2025/117715
Publication Date
05.06.2025
International Application No.
PCT/US2024/057711
International Filing Date
27.11.2024
Title **
[English]
ELECTROSTATIC CHUCK WITH CONTROLLABLE TEMPERATURE, ION IMPLANTATION SYSTEM USING THE SAME AS WELL AS METHOD OF CONTROLLING THE TEMPERATURE IN SAID ELECTROSTATIC CHUCK
[French]
MANDRIN ÉLECTROSTATIQUE À TEMPÉRATURE RÉGLABLE, SYSTÈME D'IMPLANTATION IONIQUE L'UTILISANT ET PROCÉDÉ DE RÉGULATION DE LA TEMPÉRATURE DANS LEDIT MANDRIN ÉLECTROSTATIQUE
Applicants **
AXCELIS TECHNOLOGIES, INC.
Inventors
BAGGETT, John
Priority Data
63/604,353
30.11.2023
US
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
| Number of Priorities | * |
| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
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| Pages of Specification | * |
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| Number of Office Actions | * |
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International Searching Authority |
EPO
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| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
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| Type of Assignment |
The Standard Agent's Assignment
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| Applicant's Legal Status |
Legal Entity
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| * | |
| * | |
| * | |
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| Entry into National Phase under |
Chapter I
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| Patent Delivery |
Send the Letters Patent by Courier
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| Translation |
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* The data is based on automatic recognition. Please verify and amend if necessary.
** IP-Coster compiles data from publicly available sources. If this data includes your personal information, you can contact us to request its removal.
Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 2520 | |
| EPO | Filing, Examination, Granting | 16354 | |
| Japan | Filing, Examination, Granting | 2647 | |
| South Korea | Filing, Examination, Granting | 3069 | |
| USA | Filing, Examination, Granting | 6940 |
Total:
31,530
The term for entry into the National Phase has expired. This quotation is for informational purposes only
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Abstract[English]
A clamping system has a workpiece clamp (102) having a platen (108) to support a workpiece (106) and heating elements (118) for heating the platen (108) to a platen temperature. A cooling plate (122) has cooling features to cool to the cooling plate. A vacuum chamber (128) defines a chamber volume between the platen (108) and the cooling plate (122). One or more radiation shields (140) within the chamber volume (128) can limit a radiative heat transfer between the platen (108) and the cooling plate (122). A vacuum source (134) and a gas source (142) are selectively fluidly coupled to the chamber volume. A controller (156) controls the platen (108) temperature in both a high and a low temperature regime by controlling a pressure within the vacuum chamber (128) through the vacuum source (134) and gas source (142) to control a heat transfer between the platen (108) and the cooling plate (122).[French]
Un système de serrage comprend une pince de pièce (102) avec un plateau (108) pour supporter une pièce (106) et des éléments chauffants (118) pour chauffer le plateau (108) à une température de plateau. Une plaque de refroidissement (122) comprend des éléments de refroidissement pour refroidir la plaque de refroidissement. Une chambre à vide (128) définit un volume de chambre entre le plateau (108) et la plaque de refroidissement (122). Un ou plusieurs écrans de protection contre le rayonnement (140) à l'intérieur du volume de chambre (128) peuvent limiter un transfert de chaleur par rayonnement entre le plateau (108) et la plaque de refroidissement (122). Une source de vide (134) et une source de gaz (142) sont sélectivement couplées de manière fluidique au volume de chambre. Un dispositif de commande (156) commande la température du plateau (108) à la fois dans un régime à haute et basse température par commande d'une pression à l'intérieur de la chambre à vide (128) à travers la source de vide (134) et la source de gaz (142) pour commander un transfert de chaleur entre le plateau (108) et la plaque de refroidissement (122).