WO2024233871 - ORGANOTIN PHOTORESIST COMPOSITION AND METHOD OF STABILIZATION
National phase entry is expected:
Publication Number
WO/2024/233871
Publication Date
14.11.2024
International Application No.
PCT/US2024/028746
International Filing Date
10.05.2024
Title **
[English]
ORGANOTIN PHOTORESIST COMPOSITION AND METHOD OF STABILIZATION
[French]
COMPOSITION DE RÉSINE PHOTOSENSIBLE D'ORGANOÉTAIN ET PROCÉDÉ DE STABILISATION
Applicants **
LU, Feng
3700 Parkview Lane, Apt 25D
Irvine, California 92612-1838, US
Inventors
LU, Feng
3700 Parkview Lane, Apt 25D
Irvine, California 92612-1838, US
Priority Data
63/465,610
11.05.2023
US
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
| Number of Priorities | * |
| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
| Pages for Publication | * |
| Number of Pages with Drawings | * |
| Pages of Specification | * |
| * | |
| * | |
International Searching Authority |
USPTO
* |
| * | |
| Applicant's Legal Status |
Natural Person
* |
| * | |
| * | |
| * | |
| Entry into National Phase under |
Chapter I
* |
| Translation |
|
Recalculate
* The data is based on automatic recognition. Please verify and amend if necessary.
** IP-Coster compiles data from publicly available sources. If this data includes your personal information, you can contact us to request its removal.
Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing | 1274 | |
| EPO | Filing, Examination | 6204 | |
| Japan | Filing | 587 | |
| South Korea | Filing | 574 | |
| USA | Filing, Examination | 2480 |
Total: 11119 USD
The term for entry into the National Phase has expired. This quotation is for informational purposes only
Abstract[English]
are each independently a substituted or unsubstituted alkyl, alkenyl, alkynyl, cycloalkyl, or cycloalkenyl group with 1 to 20 carbon atoms, or a substituted or unsubstituted aryl group with 6-20 carbon atoms, or an amine, cyclic amine, cyano, ether, cyclic ether, ester, cyclic ester, halide, nitro, silyl, thiol, or carbonyl group. A method of stabilization of organotin photoresist composition comprises adding an organic additive.[French]
L'invention concerne une composition de résine photosensible d'organoétain pour rayonnement actinique et un procédé de stabilisation. La composition de résine photosensible d'organoétain comprend un composé d'organoétain représenté par les formules chimiques [RSnOO]4Sn, [RSnOO]3SnR1, [RSnOO]2SnR1 2, [RSnOO]SnR1 3, [R3SnO]4Sn, [R3SnO]3SnR1, [R3SnO]2SnR1 2, [R3SnO]SnR1 3, ou R2Sn(µ-O)2Sn(µ-O)2SnR2, un solvant et un additif, R, R1 étant chacun indépendamment un groupe alkyle, alcényle, alcynyle, cycloalkyle ou cycloalcényle substitué ou non substitué ayant de 1 à 20 atomes de carbone, ou un groupe aryle substitué ou non substitué ayant de 6 à 20 atomes de carbone, ou un groupe amine, amine cyclique, cyano, éther, éther cyclique, ester, ester cyclique, halogénure, nitro, silyle, thiol ou carbonyle. Un procédé de stabilisation de la composition de résine photosensible d'organoétain comprend l'ajout d'un additif organique.