WO2025202718 - PLASMONIC DEVICE
National phase entry is expected:
Publication Number
WO/2025/202718
Publication Date
02.10.2025
International Application No.
PCT/IB2025/000141
International Filing Date
27.03.2025
Title **
[English]
PLASMONIC DEVICE
[French]
DISPOSITIF PLASMONIQUE
Applicants **
OSTIA TECHNOLOGIES LIMITED
Inventors
WONG, Ka Wai
Priority Data
18/617,894
27.03.2024
US
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
| Number of Priorities | * |
| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
| Pages for Publication | * |
| Number of Pages with Drawings | * |
| Pages of Specification | * |
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| Number of Office Actions | * |
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International Searching Authority |
EPO
* |
| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
* |
| Type of Assignment |
The Standard Agent's Assignment
* |
| Applicant's Legal Status |
Legal Entity
* |
| * | |
| * | |
| * | |
| * | |
| * | |
| Entry into National Phase under |
Chapter I
* |
| Patent Delivery |
Send the Letters Patent by Courier
* |
| Translation |
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* The data is based on automatic recognition. Please verify and amend if necessary.
** IP-Coster compiles data from publicly available sources. If this data includes your personal information, you can contact us to request its removal.
Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 3172 | |
| EPO | Filing, Examination, Granting | 29988 | |
| Japan | Filing, Examination, Granting | 3325 | |
| South Korea | Filing, Examination, Granting | 4447 | |
| USA | Filing, Examination, Granting | 11340 |
Total:
52,272
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Abstract[English]
A plasmonic substrate fabrication method is formed using sacrificial nanostructures (101) or microstructures of removable materials printed onto a substrate (100), and subsequent deposition or growth of a plasmonic material layer (103) such as metal or graphene. After the sacrificial structures (101) are removed, plasmonic hotspots of nanoscale or microscale dimension (W) and geometry are obtained on the substrate, enabling various sensing and detection of analytes based on plasmonic techniques.[French]
Un procédé de fabrication de substrat plasmonique consiste à former des nanostructures sacrificielles (101) ou des microstructures de matériaux amovibles imprimés sur un substrat (100), puis à déposer ou à faire croître une couche de matériau plasmonique (103) tel qu'un métal ou du graphène. Après élimination des structures sacrificielles (101), des points chauds plasmoniques de dimension (W) et de géométrie nanométriques ou micrométriques sont obtenus sur le substrat, permettant la détection de divers analytes au moyen de techniques plasmoniques.