WO2026062408 - VACUUM DEPOSITION SYSTEM AND METHOD OF COATING SUBSTRATES IN A VACUUM DEPOSITION SYSTEM
National phase entry is expected:
Publication Number
WO/2026/062408
Publication Date
26.03.2026
International Application No.
PCT/IB2024/059070
International Filing Date
18.09.2024
Title **
[English]
VACUUM DEPOSITION SYSTEM AND METHOD OF COATING SUBSTRATES IN A VACUUM DEPOSITION SYSTEM
[French]
SYSTÈME DE DÉPÔT SOUS VIDE ET PROCÉDÉ DE REVÊTEMENT DE SUBSTRATS DANS UN SYSTÈME DE DÉPÔT SOUS VIDE
Applicants **
APPLIED MATERIALS, INC.
Inventors
JAGADISH, Avinash
P J, Girish
BHOSKI, Suhas
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
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| Number of Multi-Dependent Claims | * |
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International Searching Authority |
MOIP
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| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
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| Type of Assignment |
The Standard Agent's Assignment
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| Applicant's Legal Status |
Legal Entity
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| * | |
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| Entry into National Phase under |
Chapter I
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| Patent Delivery |
Send the Letters Patent by Courier
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| Translation |
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* The data is based on automatic recognition. Please verify and amend if necessary.
** IP-Coster compiles data from publicly available sources. If this data includes your personal information, you can contact us to request its removal.
Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 2251 | |
| EPO | Filing, Examination, Granting | 15212 | |
| Japan | Filing, Examination, Granting | 2399 | |
| South Korea | Filing, Examination, Granting | 1828 | |
| USA | Filing, Examination, Granting | 5740 |
Total:
27,430
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Abstract[English]
A chamber assembly is described. The chamber assembly includes a first vacuum chamber providing a first vacuum region with a first track and having a first back wall with a first recess; a second vacuum chamber providing a second vacuum region with a second track separated from the first vacuum region, and having a second back wall with a second recess, the second back wall facing the first back wall; and one or more rib structures provided in the first recess and the second recess and outside the first vacuum region and the second vacuum region.[French]
L'invention décrit un ensemble chambre. L'ensemble chambre comprend une première chambre à vide fournissant une première région de vide dotée d'une première piste et ayant une première paroi arrière dotée d'un premier évidement ; une seconde chambre à vide fournissant une seconde région de vide dotée d'une seconde piste séparée de la première région de vide, et ayant une seconde paroi arrière dotée d'un second évidement, la seconde paroi arrière faisant face à la première paroi arrière ; et une ou plusieurs structures de nervure ménagées dans le premier évidement et le second évidement et à l'extérieur de la première région de vide et de la seconde région de vide.