WO2024105582 - MATERIAL DEPOSITION SYSTEM EQUIPMENT MAINTENANCE
National phase entry is expected:
Publication Number
WO/2024/105582
Publication Date
23.05.2024
International Application No.
PCT/IB2023/061508
International Filing Date
14.11.2023
Title **
[English]
MATERIAL DEPOSITION SYSTEM EQUIPMENT MAINTENANCE
[French]
MAINTENANCE D'ÉQUIPEMENT DE SYSTÈME DE DÉPÔT DE MATÉRIAU
Applicants **
SILANNA UV TECHNOLOGIES PTE LTD
Inventors
ATANACKOVIC, Petar
Priority Data
18/056,062
16.11.2022
US
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
| Number of Priorities | * |
| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
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| Pages of Specification | * |
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| Number of Office Actions | * |
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International Searching Authority |
MOIP
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| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
* |
| Type of Assignment |
The Standard Agent's Assignment
* |
| Applicant's Legal Status |
Legal Entity
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| * | |
| * | |
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| Entry into National Phase under |
Chapter I
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| Patent Delivery |
Send the Letters Patent by Courier
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| Translation |
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* The data is based on automatic recognition. Please verify and amend if necessary.
** IP-Coster compiles data from publicly available sources. If this data includes your personal information, you can contact us to request its removal.
Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 2699 | |
| EPO | Filing, Examination, Granting | 18607 | |
| Japan | Filing, Examination, Granting | 2523 | |
| South Korea | Filing, Examination, Granting | 2171 | |
| USA | Filing, Examination, Granting | 6140 |
Total:
32,140
The term for entry into the National Phase has expired. This quotation is for informational purposes only
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Abstract[English]
Methods and systems for material deposition system equipment maintenance include evacuating a growth chamber of a material deposition system. The system comprises a growth chamber configured for a vacuum environment. A fluid circulation panel is inside the growth chamber, spaced apart from an inner surface of the growth chamber and comprising walls around an interior of the fluid circulation panel. A first port is in communication with the interior of the fluid circulation panel. A gas heater is coupled to the first port to heat and supply a heated gas into the interior of the fluid circulation panel to heat the walls of the fluid circulation panel. Methods include heating the gas with the gas heater and supplying the gas into the interior of the fluid circulation panel. The fluid circulation panel is heated, using the gas supplied to the interior of the fluid circulation panel.[French]
L'invention concerne des procédés et des systèmes de maintenance d'équipement de système de dépôt de matériau comprenant la mise sous vide d'une chambre de croissance d'un système de dépôt de matériau. Le système comprend une chambre de croissance configurée pour un environnement sous vide. Un panneau de circulation de fluide se trouve à l'intérieur de la chambre de croissance, espacé d'une surface interne de la chambre de croissance et comprenant des parois autour d'un intérieur du panneau de circulation de fluide. Un premier orifice est en communication avec l'intérieur du panneau de circulation de fluide. Un dispositif de chauffage de gaz est couplé au premier orifice pour chauffer et fournir un gaz chauffé à l'intérieur du panneau de circulation de fluide afin de chauffer les parois du panneau de circulation de fluide. Les procédés comprennent le chauffage du gaz avec le dispositif de chauffage de gaz et la fourniture du gaz à l'intérieur du panneau de circulation de fluide. Le panneau de circulation de fluide est chauffé en utilisant le gaz fourni à l'intérieur du panneau de circulation de fluide.