WO2024074922 - EXHAUST GAS ABATEMENT SYSTEM AND METHOD THEREOF
National phase entry:
Publication Number
WO/2024/074922
Publication Date
11.04.2024
International Application No.
PCT/IB2023/059305
International Filing Date
20.09.2023
Title **
[English]
EXHAUST GAS ABATEMENT SYSTEM AND METHOD THEREOF
[French]
SYSTÈME DE RÉDUCTION DE GAZ D'ÉCHAPPEMENT ET PROCÉDÉ ASSOCIÉ
Applicants **
EDWARDS VACUUM LLC
Inventors
MAHAWILI, Imad
Priority Data
63/378,259
04.10.2022
US
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
| Number of Priorities | * |
| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
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| Pages of Specification | * |
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International Searching Authority |
EPO
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| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
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| Type of Assignment |
The Standard Agent's Assignment
* |
| Applicant's Legal Status |
Legal Entity
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| * | |
| * | |
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| Entry into National Phase under |
Chapter I
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| Patent Delivery |
Send the Letters Patent by Courier
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| Translation |
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* The data is based on automatic recognition. Please verify and amend if necessary.
** IP-Coster compiles data from publicly available sources. If this data includes your personal information, you can contact us to request its removal.
Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 2023 | |
| EPO | Filing, Examination, Granting | 8149 | |
| Japan | Filing, Examination, Granting | 2183 | |
| South Korea | Filing, Examination, Granting | 2017 | |
| USA | Filing, Examination, Granting | 4740 |
Total:
19,112
The term for entry into the National Phase has expired. This quotation is for informational purposes only
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Abstract[English]
The present invention provides an exhaust gas abatement system for use in semiconductor processing. The system comprising a vacuum pump having an exhaust outlet, a water eductor coupled to the exhaust outlet of the vacuum pump, and a separator coupled to the water eductor. The system further comprises an exhaust gas abatement apparatus coupled to a gaseous exhaust outlet of the separator. Wherein the system is configured such that, in use, an exhaust flow from the exhaust outlet of the vacuum pump is conveyed to the separator via the water eductor, and wherein the separator is configured, in use, to separate a gaseous component of the exhaust flow from the non-gaseous component of the exhaust flow.[French]
La présente invention concerne un système de réduction de gaz d'échappement destiné à être utilisé dans le traitement de semi-conducteurs. Le système comprend une pompe à vide comportant une sortie d'échappement, un éjecteur d'eau accouplé à la sortie d'échappement de la pompe à vide, et un séparateur accouplé à l'éjecteur d'eau. Le système comprend en outre un appareil de réduction de gaz d'échappement accouplé à une sortie d'échappement gazeux du séparateur. Le système est conçu de sorte que, lors de l'utilisation, un flux d'échappement provenant de la sortie d'échappement de la pompe à vide est transporté vers le séparateur par l'intermédiaire de l'éjecteur d'eau, et le séparateur est conçu, lors de l'utilisation, pour séparer un composant gazeux du flux d'échappement du composant non gazeux du flux d'échappement.