WO2023238069 - ALIGNMENT MARK IN BUSY PIXEL LAYOUTS
National phase entry:
Publication Number
WO/2023/238069
Publication Date
14.12.2023
International Application No.
PCT/IB2023/055897
International Filing Date
07.06.2023
Title **
[English]
ALIGNMENT MARK IN BUSY PIXEL LAYOUTS
[French]
REPÈRE D'ALIGNEMENT DANS DES AGENCEMENTS DE PIXELS OCCUPÉS
Applicants **
VUEREAL INC.
Inventors
CHAJI, Gholamreza
FATHI, Ehsanollah
SIBONI, Hossein Zamani
Priority Data
63/349,872
07.06.2022
US
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
| Number of Priorities | * |
| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
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International Searching Authority |
CIPO
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| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
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| Type of Assignment |
The Standard Agent's Assignment
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| Applicant's Legal Status |
Legal Entity
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| * | |
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| Entry into National Phase under |
Chapter I
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| Patent Delivery |
Send the Letters Patent by Courier
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| Translation |
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Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 2997 | |
| EPO | Filing, Examination, Granting | 27373 | |
| Japan | Filing, Examination, Granting | 3108 | |
| South Korea | Filing, Examination, Granting | 4196 | |
| USA | Filing, Examination, Granting | 13540 |
Total:
51,214
The term for entry into the National Phase has expired. This quotation is for informational purposes only
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Abstract[English]
This disclosure relates to the process of alignment using at least an alignment mark or structure that exists on the system substrate (or donor substrate) and at least an alignment mark is associated with microdevices. The alignment marks used to align the microdevices are created by changing optical properties of the structure. The disclosure further outlines different alignment mark structures.[French]
La présente invention concerne un procédé d'alignement utilisant au moins un repère ou une structure d'alignement présent sur le substrat de système (ou le substrat donneur) et au moins un repère d'alignement est associé à des micro-dispositifs. Les repères d'alignement utilisés pour aligner les micro-dispositifs sont créés par modification des propriétés optiques de la structure. L'invention concerne en outre différentes structures de repères d'alignement.