WO2022224040 - METHODS AND SYSTEMS FOR PROVIDING PLASMA TREATMENTS TO OPTICAL SURFACES
National phase entry:
Publication Number
WO/2022/224040
Publication Date
27.10.2022
International Application No.
PCT/IB2022/000240
International Filing Date
22.04.2022
Title **
[English]
METHODS AND SYSTEMS FOR PROVIDING PLASMA TREATMENTS TO OPTICAL SURFACES
[French]
PROCÉDÉS ET SYSTÈMES POUR FOURNIR DES TRAITEMENTS PAR PLASMA À DES SURFACES OPTIQUES
Applicants **
PLASMATICA LTD.
Hashaf 108
4588500 Salit, IL
Inventors
SAGIV, Adam
4 Harishonim Street
6099100 Moshav Bnei Atarot, IL
LAM, Amnon
D.N. Hevel Megido
19225 Kibutz Givat Oz, IL
PERLE, Amir
c/o Plasmatica LTD.
4 Harishonim Street
6099100 Moshav Bnei Atarot, IL
WOLSON, Shuki
c/o Plasmatica LTD.
4 Harishonim Street
6099100 Moshav Bnei Atarot, IL
Priority Data
288770
08.12.2021
IL
63/178,024
22.04.2021
US
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
| Number of Priorities | * |
| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
| Pages for Publication | * |
| Number of Pages with Drawings | * |
| Pages of Specification | * |
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International Searching Authority |
ILPO
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| Applicant's Legal Status |
Legal Entity
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| * | |
| * | |
| * | |
| * | |
| Entry into National Phase under |
Chapter I
* |
| Translation |
|
Recalculate
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Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing | 7006 | |
| EPO | Filing, Examination | 140307 | |
| Japan | Filing | 595 | |
| South Korea | Filing | 607 | |
| USA | Filing, Examination | 49260 |
Total: 197775 USD
The term for entry into the National Phase has expired. This quotation is for informational purposes only
Abstract[English]
A plasma generation device for treating objects, the device comprising: a housing; a plasma-generation zone within the housing configured to enable accommodation of an object; circuitry for supplying energy to carry out a plasma treatment for increasing hydrophilicity of the object to a desired level; at least one sensor configured to measure at least one plasma-activation parameter during the plasma treatment; and at least one processor configured to: determine, based on the at least one plasma-activation parameter, that the plasma treatment is below a threshold for increasing the hydrophilicity of the object to the desired level; and output a notification indicating of plasma treatment failure.[French]
L'invention concerne un dispositif de génération de plasma pour traiter des objets, le dispositif comprenant : un boîtier; une zone de génération de plasma à l'intérieur du boîtier conçue pour permettre la réception d'un objet; des circuits pour fournir de l'énergie pour effectuer un traitement au plasma pour augmenter l'hydrophilie de l'objet à un niveau souhaité; au moins un capteur conçu pour mesurer au moins un paramètre d'activation de plasma pendant le traitement au plasma; et au moins un processeur conçu pour : déterminer, sur la base du ou des paramètres d'activation de plasma, que le traitement au plasma est au-dessous d'un seuil pour augmenter le caractère hydrophile de l'objet au niveau souhaité; et délivrer en sortie une notification indiquant une défaillance de traitement au plasma.