WO2023026021 - METHOD AND APPARATUS FOR MODIFYING A SUBSTRATE
National phase entry:
Publication Number
WO/2023/026021
Publication Date
02.03.2023
International Application No.
PCT/GB2022/052060
International Filing Date
05.08.2022
Title **
[English]
METHOD AND APPARATUS FOR MODIFYING A SUBSTRATE
[French]
PROCÉDÉ ET APPAREIL POUR MODIFIER UN SUBSTRAT
Applicants **
INTEL CORPORATION
2200 Mission College Boulevard
Santa Clara, CA 95054, US
Inventors
PSAILA, Nicholas D
c/o Optoscribe Limited
Unit 1, Rosebank Park
Rosebank Road, Kirkton Campus
Livingston EH54 7EJ, GB
LAMING, Richard
c/o Optoscribe Limited
Unit 1, Rosebank Park
Rosebank Road, Kirkton Campus
Livingston EH54 7EJ, GB
Priority Data
2112125.6
24.08.2021
GB
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
| Number of Priorities | * |
| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
| Pages for Publication | * |
| Number of Pages with Drawings | * |
| Pages of Specification | * |
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| * | |
International Searching Authority |
EPO
* |
| Applicant's Legal Status |
Legal Entity
* |
| * | |
| * | |
| * | |
| * | |
| Entry into National Phase under |
Chapter I
* |
| Translation |
|
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Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing | 1507 | |
| EPO | Filing, Examination | 8652 | |
| Japan | Filing | 589 | |
| South Korea | Filing | 575 | |
| USA | Filing, Examination | 3910 |
Total: 15233 USD
The term for entry into the National Phase has expired. This quotation is for informational purposes only
Abstract[English]
The present application relates to a method for modifying a substrate, which comprises generating a pulsed laser beam comprising a train of laser pulses, the train of laser pulses including at least three consecutive laser pulses, and controlling a direction of the pulsed laser beam and/or a position of the substrate from laser pulse to laser pulse so that the at least three consecutive laser pulses sequentially irradiate at least three regions of the substrate according to a predetermined spatial sequence which defines the relative spatial positions of the at least three regions of the substrate and the order of irradiation of the at least three regions of the substrate. The present application relates also to an apparatus (100 )for modifying a substrate (108). The method and apparatus (100) may be used, in particular though not exclusively, for forming an optical device.[French]
L'invention concerne un procédé de modification d'un substrat consistant à générer un faisceau laser pulsé comprenant un train d'impulsions laser, le train d'impulsions laser comprenant au moins trois impulsions laser consécutives, et à contrôler une direction du faisceau laser pulsé et/ou une position du substrat à partir d'une impulsion laser vers une impulsion laser de telle sorte que les au moins trois impulsions laser consécutives rayonnent de manière séquentielle sur au moins trois régions du substrat selon une séquence spatiale prédéterminée qui définit les positions spatiales relatives desdites au moins trois régions du substrat et l'ordre d'irradiation desdites au moins trois régions du substrat. La présente invention concerne également un appareil (100) pour modifier un substrat (108). Le procédé et l'appareil (100) peuvent être utilisés, en particulier, mais pas exclusivement, pour former un dispositif optique.