WO2025247494 - A MEASURING SYSTEM FOR MEASURING A DISTANCE OF A GAP BETWEEN A DONOR SUBSTRATE AND A TARGET SUBSTRATE, AND A CORRESPONDING CONTROL SYSTEM AS WELL AS RELATED METHODS
National phase entry is expected:
Publication Number
WO/2025/247494
Publication Date
04.12.2025
International Application No.
PCT/EP2024/064908
International Filing Date
30.05.2024
Title **
[English]
A MEASURING SYSTEM FOR MEASURING A DISTANCE OF A GAP BETWEEN A DONOR SUBSTRATE AND A TARGET SUBSTRATE, AND A CORRESPONDING CONTROL SYSTEM AS WELL AS RELATED METHODS
[French]
SYSTÈME DE MESURE POUR MESURER UNE LONGUEUR D'UN ESPACE ENTRE UN SUBSTRAT DONNEUR ET UN SUBSTRAT CIBLE, ET SYSTÈME DE COMMANDE CORRESPONDANT AINSI QUE PROCÉDÉS ASSOCIÉS
Applicants **
NEXPERIA B.V.
Inventors
WESSELINGH, Jasper
VERMEER, Adrianus Johannes Petrus Maria
VAN DIJCK, Kevin
VERMEER, Martin
Application details
| Total Number of Claims/PCT | * |
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International Searching Authority |
EPO
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| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
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| Type of Assignment |
The Standard Agent's Assignment
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| Applicant's Legal Status |
Legal Entity
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| * | |
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| Entry into National Phase under |
Chapter I
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| Patent Delivery |
Send the Letters Patent by Courier
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| Translation |
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* The data is based on automatic recognition. Please verify and amend if necessary.
** IP-Coster compiles data from publicly available sources. If this data includes your personal information, you can contact us to request its removal.
Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 1922 | |
| EPO | Filing, Examination, Granting | 8113 | |
| Japan | Filing, Examination, Granting | 2122 | |
| South Korea | Filing, Examination, Granting | 1915 | |
| USA | Filing, Examination, Granting | 5340 |
Total:
19,412
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Abstract[English]
A measuring system arranged for measuring a distance of a gap between a donor substrate and a target substrate, the measuring system comprising a light source, the donor substrate comprising at least one interconnect material for mounting an electronic component on the target substrate, which is positioned next to the donor substrate such that the gap arises between the target substrate and the donor substrate, wherein the target substrate is arranged to at least partially reflect the light that partially transmitted the donor substrate towards the optical sensor, the optical sensor arranged for capturing the reflected light from the donor substrate and from the target substrate and arranged for measuring the distance of the gap between the donor substrate and the target substrate by determining the difference in focal distance of the light reflected from the donor substrate and light reflected from the target substrate.[French]
Système de mesure agencé pour mesurer une longueur d'un espace entre un substrat donneur et un substrat cible, le système de mesure comprenant une source de lumière, le substrat donneur comprenant au moins un matériau d'interconnexion permettant le montage d'un composant électronique sur le substrat cible, qui est positionné à côté du substrat donneur de sorte que l'espace apparaît entre le substrat cible et le substrat donneur, le substrat cible étant agencé pour réfléchir au moins partiellement la lumière partiellement transmise par le substrat donneur vers le capteur optique, le capteur optique étant agencé pour capturer la lumière réfléchie par le substrat donneur et le substrat cible et agencé pour mesurer la longueur de l'espace entre le substrat donneur et le substrat cible en déterminant la différence de distance focale entre la lumière réfléchie par le substrat donneur et la lumière réfléchie par le substrat cible.