WO2023156419 - POSITIVE TYPE LIFT-OFF RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST PATTERN USING THE SAME
National phase entry:
Publication Number
WO/2023/156419
Publication Date
24.08.2023
International Application No.
PCT/EP2023/053692
International Filing Date
15.02.2023
Title **
[English]
POSITIVE TYPE LIFT-OFF RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST PATTERN USING THE SAME
[French]
COMPOSITION DE RÉSERVE À DÉCOLLEMENT DE TYPE POSITIF ET PROCÉDÉ DE FABRICATION DE MOTIF DE RÉSERVE L'UTILISANT
Applicants **
MERCK PATENT GMBH
Frankfurter Strasse 250
64293 Darmstadt, DE
Inventors
YANO, Tomotsugu
c/o Merck Elelectronics Ltd.
Arco Tower 4F, 1-8-1 Shimomeguro 1-chome
Meguro-ku
TOKYO 153-8927, JP
HAMA, Yusuke
c/o Merck Elelectronics Ltd.
Arco Tower 4F, 1-8-1 Shimomeguro 1-chome
Meguro-ku
TOKYO 153-8927, JP
HITOKAWA, Hiroshi
c/o Merck Elelectronics Ltd.
Arco Tower 4F, 1-8-1 Shimomeguro 1-chome
Meguro-ku
TOKYO 153-8927, JP
Priority Data
2022-024091
18.02.2022
JP
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
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| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
| Pages for Publication | * |
| Number of Pages with Drawings | * |
| Pages of Specification | * |
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International Searching Authority |
EPO
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| Applicant's Legal Status |
Legal Entity
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| Entry into National Phase under |
Chapter I
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| Translation |
|
Recalculate
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Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing | 1446 | |
| EPO | Filing, Examination | 6563 | |
| Japan | Filing | 594 | |
| South Korea | Filing | 575 | |
| USA | Filing, Examination | 2710 |
Total: 11888 USD
The term for entry into the National Phase has expired. This quotation is for informational purposes only
Abstract[English]
[Problem] A positive type lift-off resist composition is provided. [Means for Solution] A positive type lift-off resist composition comprising a polymer (A) having a certain structure and cLogP of 2.76 to 3.35, a photoacid generator (B) and a solvent (C).[French]
La présente invention a pour objet de fournir une composition de réserve à décollement de type positif. À cet effet, l'invention concerne une composition de réserve à décollement de type positif comprenant un polymère (A) ayant une certaine structure et cLogP de 2,76 à 3,35, un générateur de photoacide (B) et un solvant (C).