WO2023151992 - ETCHING COMPOSITION AND METHOD FOR ETCHING AT LEAST ONE SURFACE OF A SULFUR-CONTAINING THERMOPLASTIC RESIN-SUBSTRATE

National phase entry:
Publication Number WO/2023/151992
Publication Date 17.08.2023
International Application No. PCT/EP2023/052361
International Filing Date 31.01.2023
Title **
[English] ETCHING COMPOSITION AND METHOD FOR ETCHING AT LEAST ONE SURFACE OF A SULFUR-CONTAINING THERMOPLASTIC RESIN-SUBSTRATE
[French] COMPOSITION DE GRAVURE ET PROCÉDÉ DE GRAVURE D'AU MOINS UNE SURFACE D'UN SUBSTRAT EN RÉSINE THERMOPLASTIQUE CONTENANT DU SOUFRE
Applicants **
ATOTECH DEUTSCHLAND GMBH & CO. KG Erasmusstraße 20 10553 Berlin, DE
Inventors
BAYER, Frank c/o Atotech Deutschland GmbH & Co. KG Intellectual Property Erasmusstraße 20 10553 Berlin, DE
KARAGÖL, Serdar Turan c/o Atotech Deutschland GmbH & Co. KG Intellectual Property Erasmusstraße 20 10553 Berlin, DE
Priority Data
22155710.1   08.02.2022   EP
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Quotation for National Phase entry

Country StagesTotal
China Filing1058
EPO Filing, Examination4601
Japan Filing591
South Korea Filing575
USA Filing, Examination2710
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Total: 9535

The term for entry into the National Phase has expired. This quotation is for informational purposes only

Abstract[English] The present invention relates to a method for etching at least one surface of a sulfur-containing thermoplastic resin-substrate, the method comprising the steps (A) to (C), wherein step (C) is an etching step including a contacting with a liquid etching composition. The liquid etching composition comprises (a) a mineral acid selected from the group consisting of sulfuric acid and nitric acid, and (b) a dialkyl sulfoxide and/or a phenyl-comprising sulfoxide.[French] La présente invention concerne un procédé de gravure d'au moins une surface d'un substrat en résine thermoplastique contenant du soufre, le procédé comprenant les étapes (A) à (C), l'étape (C) étant une étape de gravure comprenant une mise en contact avec une composition de gravure liquide. La composition de gravure liquide comprend (a) un acide minéral choisi dans le groupe constitué par l'acide sulfurique et l'acide nitrique, et (b) un sulfoxyde de dialkyle et/ou un sulfoxyde comprenant du phényle.
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