WO2023001630 - METHOD FOR PRODUCING A GALLIUM OXIDE LAYER ON A SUBSTRATE

National phase entry:
Publication Number WO/2023/001630
Publication Date 26.01.2023
International Application No. PCT/EP2022/069433
International Filing Date 12.07.2022
Title **
[English] METHOD FOR PRODUCING A GALLIUM OXIDE LAYER ON A SUBSTRATE
[French] PROCÉDÉ POUR LA PRODUCTION D'UNE COUCHE D'OXYDE DE GALLIUM SUR UN SUBSTRAT
Applicants **
SILTRONIC AG Einsteinstr. 172 Tower B / Blue Tower 81677 München, DE
Inventors
HÄCKL, Walter Fasanenstr. 7 84558 Kirchweidach, DE
CHOU, Ta-shun Streitstr. 23 13587 Berlin, DE
POPP, Andreas August-B.-Allee 7 15732 Eichwalde, DE
Priority Data
21187231.2   22.07.2021   EP
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Quotation for National Phase entry

Country StagesTotal
China Filing972
EPO Filing, Examination4601
Japan Filing591
South Korea Filing575
USA Filing, Examination2710
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Total: 9449

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Abstract[English] represents a dimensionless layer surface reflectivity index calculated from the quotient of the measured second layer surface reflectivity and the extrapolated layer surface reflectivity from the regression curve evaluated at the second layer thickness.[French] représente un indice de réflectivité de surface de couche sans dimension calculé à partir du quotient de la seconde réflectivité de surface de couche mesurée et de la réflectivité de surface de couche extrapolée à partir de la courbe de régression évaluée à la seconde épaisseur de couche.
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