WO2023066510 - METHOD FOR FORMING HARD AND ULTRA-SMOOTH A-C BY SPUTTERING
National phase entry:
Publication Number
WO/2023/066510
Publication Date
27.04.2023
International Application No.
PCT/EP2022/000088
International Filing Date
04.10.2022
Title **
[English]
METHOD FOR FORMING HARD AND ULTRA-SMOOTH A-C BY SPUTTERING
[French]
PROCÉDÉ DE FORMATION D'A-C DUR ET ULTRA-LISSE PAR PULVÉRISATION
Applicants **
OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
Churerstrasse 120
8808 Pfäffikon, CH
Inventors
KERAUDY, Julien
Churerstrasse 80
9470 Buchs, CH
GUIMOND, Sebastien
Lenaustrasse16
9000 St. Gallen, CH
KRASSNITZER, Siegfried
Runastrasse 40A
6800 Feldkirch, AT
Priority Data
102021005266.8
22.10.2021
DE
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
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| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
| Pages for Publication | * |
| Number of Pages with Drawings | * |
| Pages of Specification | * |
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International Searching Authority |
EPO
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| Applicant's Legal Status |
Legal Entity
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| Entry into National Phase under |
Chapter I
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| Translation |
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Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing | 995 | |
| EPO | Filing, Examination | 4622 | |
| Japan | Filing | 591 | |
| South Korea | Filing | 575 | |
| USA | Filing, Examination | 2710 |
Total: 9493 USD
The term for entry into the National Phase has expired. This quotation is for informational purposes only
Abstract[English]
The invention relates to a method for forming a coating on a substrate with the help of a coating device and a device for providing non-reactive ions characterized in that a negative bias is applied to the substrate for effecting an ion bombardment on the material deposited on the substrate thereby increasing the density of the material deposited.[French]
L'invention concerne un procédé de formation d'un revêtement sur un substrat à l'aide d'un dispositif de revêtement et d'un dispositif de fourniture d'ions non réactifs, caractérisé en ce qu'une polarisation négative est appliquée au substrat pour effectuer un bombardement ionique sur le matériau déposé sur le substrat, ce qui permet d'augmenter la densité du matériau déposé.