WO2026108019 - BUFFER LAYER STRUCTURE, EPITAXIAL STRUCTURE AND MANUFACTURING METHOD THEREOF

National phase entry is expected:
Publication Number WO/2026/108019
Publication Date 28.05.2026
International Application No. PCT/CN2025/080396
International Filing Date 04.03.2025
Title **
[English] BUFFER LAYER STRUCTURE, EPITAXIAL STRUCTURE AND MANUFACTURING METHOD THEREOF
[French] STRUCTURE DE COUCHE TAMPON, STRUCTURE ÉPITAXIALE ET PROCÉDÉ DE FABRICATION ASSOCIÉ
Applicants **
JADE BIRD DISPLAY (SHANGHAI) LIMITED
Inventors
LV, Wei
Priority Data
PCT/CN2024/132110   22.11.2024   CN
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Quotation for National Phase entry

Country StagesTotal
China Filing, Examination, Granting2443
EPO Filing, Examination, Granting24312
Japan Filing, Examination, Granting2923
South Korea Filing, Examination, Granting3798
USA Filing, Examination, Granting8740
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Total: 42,216
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Abstract[English] A buffer layer structure applied in an epitaxial structure. The buffer layer structure includes a preparation structure provided on a substrate; and a transition structure provided on the preparation structure.[French] L'invention porte sur une structure de couche tampon appliquée dans une structure épitaxiale. La structure de couche tampon comprend une structure de préparation disposée sur un substrat; et une structure de transition placée sur la structure de préparation.