WO2026108019 - BUFFER LAYER STRUCTURE, EPITAXIAL STRUCTURE AND MANUFACTURING METHOD THEREOF
National phase entry is expected:
Publication Number
WO/2026/108019
Publication Date
28.05.2026
International Application No.
PCT/CN2025/080396
International Filing Date
04.03.2025
Title **
[English]
BUFFER LAYER STRUCTURE, EPITAXIAL STRUCTURE AND MANUFACTURING METHOD THEREOF
[French]
STRUCTURE DE COUCHE TAMPON, STRUCTURE ÉPITAXIALE ET PROCÉDÉ DE FABRICATION ASSOCIÉ
Applicants **
JADE BIRD DISPLAY (SHANGHAI) LIMITED
Inventors
LV, Wei
Priority Data
PCT/CN2024/132110
22.11.2024
CN
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
| Number of Priorities | * |
| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
| Pages for Publication | * |
| Number of Pages with Drawings | * |
| Pages of Specification | * |
| * | |
| Number of Office Actions | * |
| * | |
International Searching Authority |
CNIPA
* |
| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
* |
| Type of Assignment |
The Standard Agent's Assignment
* |
| Applicant's Legal Status |
Legal Entity
* |
| * | |
| * | |
| * | |
| * | |
| * | |
| Entry into National Phase under |
Chapter I
* |
| Patent Delivery |
Send the Letters Patent by Courier
* |
| Translation |
|
* The data is based on automatic recognition. Please verify and amend if necessary.
** IP-Coster compiles data from publicly available sources. If this data includes your personal information, you can contact us to request its removal.
Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 2443 | |
| EPO | Filing, Examination, Granting | 24312 | |
| Japan | Filing, Examination, Granting | 2923 | |
| South Korea | Filing, Examination, Granting | 3798 | |
| USA | Filing, Examination, Granting | 8740 |

Total:
42,216
Contact Us
Abstract[English]
A buffer layer structure applied in an epitaxial structure. The buffer layer structure includes a preparation structure provided on a substrate; and a transition structure provided on the preparation structure.[French]
L'invention porte sur une structure de couche tampon appliquée dans une structure épitaxiale. La structure de couche tampon comprend une structure de préparation disposée sur un substrat; et une structure de transition placée sur la structure de préparation.