WO2023155184 - ARRAY SUBSTRATE AND DISPLAY APPARATUS
National phase entry:
Publication Number
WO/2023/155184
Publication Date
24.08.2023
International Application No.
PCT/CN2022/077005
International Filing Date
21.02.2022
Title **
[English]
ARRAY SUBSTRATE AND DISPLAY APPARATUS
[French]
SUBSTRAT MATRICIEL ET APPAREIL D'AFFICHAGE
Applicants **
BOE TECHNOLOGY GROUP CO., LTD.
No.10 Jiuxianqiao Rd., Chaoyang District
Beijing 100015, CN
Inventors
WANG, Tao
No.9 Dize Rd., BDA
Beijing 100176, CN
WEN, Mengyang
No.9 Dize Rd., BDA
Beijing 100176, CN
ZHANG, Ziyu
No.9 Dize Rd., BDA
Beijing 100176, CN
SUN, Tao
No.9 Dize Rd., BDA
Beijing 100176, CN
CUI, Yue
No.9 Dize Rd., BDA
Beijing 100176, CN
QIN, Chengjie
No.9 Dize Rd., BDA
Beijing 100176, CN
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
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| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
| Pages for Publication | * |
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| Pages of Specification | * |
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International Searching Authority |
CNIPA
* |
| Applicant's Legal Status |
Legal Entity
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| * | |
| * | |
| * | |
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| Entry into National Phase under |
Chapter I
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| Translation |
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Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing | 1293 | |
| EPO | Filing, Examination | 9101 | |
| Japan | Filing | 591 | |
| South Korea | Filing | 482 | |
| USA | Filing, Examination | 2710 |
Total: 14177 USD
The term for entry into the National Phase has expired. This quotation is for informational purposes only
Abstract[English]
An array substrate is provided. The array substrate includes a base substrate (BS); an auxiliary structure (AS) in an inter-subpixel region and on the base substrate (BS); and a cathode layer (CD) on a side of the auxiliary structure (AS) away from the base substrate (BS). The auxiliary structure (AS) includes a plurality of groups of auxiliary blocks (ASG), a respective group of the plurality of groups of auxiliary blocks (ASG) including one or more auxiliary blocks protruding away from the base substrate (BS). The plurality of groups of auxiliary blocks (ASG) are configured to enhance adhesion between an organic layer and an adjacent layer and to reduce or eliminate interlayer peeling therebetween.[French]
La présente invention concerne un substrat matriciel. Le substrat matriciel comporte un substrat de base (BS) ; une structure auxiliaire (AS) dans une région inter-sous-pixels et sur le substrat de base (BS) ; et une couche de cathode (CD) sur un côté de la structure auxiliaire (AS) à l'opposé du substrat de base (BS). La structure auxiliaire (AS) comporte une pluralité de groupes de blocs auxiliaires (ASG), un groupe respectif de la pluralité de groupes de blocs auxiliaires (ASG) comportant un ou plusieurs blocs auxiliaires faisant saillie à l'opposé du substrat de base (BS). La pluralité de groupes de blocs auxiliaires (ASG) est configurée pour améliorer l'adhérence entre une couche organique et une couche adjacente et pour réduire ou éliminer un décollement intercouche entre ces dernières.