WO2023082069 - SOLID-STATE IMAGING DEVICE, ELECTRONIC APPARATUS AND METHOD

National phase entry:
Publication Number WO/2023/082069
Publication Date 19.05.2023
International Application No. PCT/CN2021/129658
International Filing Date 09.11.2021
Title **
[English] SOLID-STATE IMAGING DEVICE, ELECTRONIC APPARATUS AND METHOD
[French] DISPOSITIF D'IMAGERIE À SEMI-CONDUCTEURS, APPAREIL ÉLECTRONIQUE ET PROCÉDÉ
Applicants **
HUAWEI TECHNOLOGIES CO., LTD. Huawei Administration Building, Bantian, Longgang District Shenzhen, Guangdong 518129, CN
Inventors
TAKAHASHI, Seiji 19F, Concurred-Yokohama, 3-1, Kinko-Cho, Kanagawa-Ku Yokohama, Kanagawa 221-0056, JP
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Quotation for National Phase entry

Country StagesTotal
China Filing1350
EPO Filing, Examination8880
Japan Filing588
South Korea Filing482
USA Filing, Examination4310
MasterCard Visa

Total: 15610

The term for entry into the National Phase has expired. This quotation is for informational purposes only

Abstract[English] A solid-state imaging device including: a photoelectric conversion part of a first conductivity type semiconductor, including a first side as an electromagnetic wave-incident side and a second side opposite the first side; an epitaxial layer being formed in a side portion of the photoelectric conversion part, and being placed apart from a first plane (A) (A) through the first side; and a separation layer being formed opposite the photoelectric conversion part with respect to the epitaxial layer.[French] L'invention concerne un dispositif d'imagerie à semi-conducteurs comprenant: une partie de conversion photoélectrique d'un semi-conducteur d'un premier type de conductivité, comprenant un premier côté en tant que côté d'incidence d'ondes électromagnétiques et un second côté opposé au premier côté; une couche épitaxiale étant formée dans une partie latérale de la partie de conversion photoélectrique, et étant espacée d'un premier plan (A) (A) à travers le premier côté; et une couche de séparation étant formée à l'opposé de la partie de conversion photoélectrique par rapport à la couche épitaxiale.
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