WO2023156419 - POSITIVE TYPE LIFT-OFF RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST PATTERN USING THE SAME
National phase entry:
Publication Number
WO/2023/156419
Publication Date
24.08.2023
International Application No.
PCT/EP2023/053692
International Filing Date
15.02.2023
Title **
[English]
POSITIVE TYPE LIFT-OFF RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST PATTERN USING THE SAME
[French]
COMPOSITION DE RÉSERVE À DÉCOLLEMENT DE TYPE POSITIF ET PROCÉDÉ DE FABRICATION DE MOTIF DE RÉSERVE L'UTILISANT
Applicants **
MERCK PATENT GMBH
Inventors
YANO, Tomotsugu
HAMA, Yusuke
HITOKAWA, Hiroshi
Priority Data
2022-024091
18.02.2022
JP
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
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| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
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| Pages of Specification | * |
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International Searching Authority |
EPO
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| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
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| Type of Assignment |
The Standard Agent's Assignment
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| Applicant's Legal Status |
Legal Entity
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| Entry into National Phase under |
Chapter I
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| Patent Delivery |
Send the Letters Patent by Courier
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| 译文 |
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Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 2393 | |
| EPO | Filing, Examination, Granting | 11750 | |
| Japan | Filing, Examination, Granting | 2343 | |
| South Korea | Filing, Examination, Granting | 2480 | |
| USA | Filing, Examination, Granting | 4740 |
Total:
23,706
The term for entry into the National Phase has expired. This quotation is for informational purposes only
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Abstract[English]
[Problem] A positive type lift-off resist composition is provided. [Means for Solution] A positive type lift-off resist composition comprising a polymer (A) having a certain structure and cLogP of 2.76 to 3.35, a photoacid generator (B) and a solvent (C).[French]
La présente invention a pour objet de fournir une composition de réserve à décollement de type positif. À cet effet, l'invention concerne une composition de réserve à décollement de type positif comprenant un polymère (A) ayant une certaine structure et cLogP de 2,76 à 3,35, un générateur de photoacide (B) et un solvant (C).