WO2025122452 - ORGANOTIN POLYMER PHOTORESIST COMPOSITION FOR PHOTOLITHOGRAPHY PATTERNING
National phase entry is expected:
Publication Number
WO/2025/122452
Publication Date
12.06.2025
International Application No.
PCT/US2024/058181
International Filing Date
03.12.2024
Title **
[English]
ORGANOTIN POLYMER PHOTORESIST COMPOSITION FOR PHOTOLITHOGRAPHY PATTERNING
[French]
COMPOSITION DE RÉSINE PHOTOSENSIBLE À BASE DE POLYMÈRE D'ORGANOÉTAIN POUR FORMATION DE MOTIFS PAR PHOTOLITHOGRAPHIE
Applicants **
LU, Feng
Inventors
LU, Feng
Priority Data
63/607,241
07.12.2023
US
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
| Number of Priorities | * |
| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
| Pages for Publication | * |
| Number of Pages with Drawings | * |
| Pages of Specification | * |
| * | |
| Number of Office Actions | * |
| * | |
International Searching Authority |
USPTO
* |
| * | |
| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
* |
| Type of Assignment |
The Standard Agent's Assignment
* |
| Applicant's Legal Status |
Natural Person
* |
| * | |
| * | |
| * | |
| * | |
| * | |
| Entry into National Phase under |
Chapter I
* |
| Patent Delivery |
Send the Letters Patent by Courier
* |
| 译文 |
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* The data is based on automatic recognition. Please verify and amend if necessary.
** IP-Coster compiles data from publicly available sources. If this data includes your personal information, you can contact us to request its removal.
Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 2247 | |
| EPO | Filing, Examination, Granting | 10462 | |
| Japan | Filing, Examination, Granting | 2307 | |
| South Korea | Filing, Examination, Granting | 2463 | |
| USA | Filing, Examination, Granting | 4310 |
Total:
21,789
The term for entry into the National Phase has expired. This quotation is for informational purposes only
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Abstract[English]
group, wherein R is H, a substituted or unsubstituted alkyl, alkenyl, alkynyl, or cycloalkyl group with 1 to 20 carbon atoms, or a substituted or unsubstituted aryl group with 6-20 carbon atoms, or an amino, cyano, ether, ester, halide, nitro, silyl, thiol, or carbonyl group.[French]
cyclopentadiényle substitué, R étant H, un groupe alkyle, alcényle, alcynyle ou cycloalkyle substitué ou non substitué ayant de 1 à 20 atomes de carbone, ou un groupe aryle substitué ou non substitué ayant de 6 à 20 atomes de carbone, ou un groupe amino, cyano, éther, ester, halogénure, nitro, silyle, thiol ou carbonyle.