WO2025153799 - MULTI-LAYER TWC FORMULATIONS WITH OPTIMALIZED PGM LOADINGS

National phase entry is expected:
Publication Number WO/2025/153799
Publication Date 24.07.2025
International Application No. PCT/GB2025/050039
International Filing Date 10.01.2025
Title **
[English] MULTI-LAYER TWC FORMULATIONS WITH OPTIMALIZED PGM LOADINGS
[French] FORMULATIONS DE TWC MULTICOUCHES AVEC CHARGEMENTS PGM OPTIMISÉS
Applicants **
JOHNSON MATTHEY PUBLIC LIMITED COMPANY
Inventors
LIU, Dongxia
VLACHOU, Maria C.
KOLPIN, Amy Louise
STONEHOUSE, Peter Charles
Priority Data
63/620,887   15.01.2024   US
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译文

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Quotation for National Phase entry

Country StagesTotal
China Filing, Examination, Granting2432
EPO Filing, Examination, Granting15245
Japan Filing, Examination, Granting2585
South Korea Filing, Examination, Granting2944
USA Filing, Examination, Granting6540
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Total: 29,746
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Abstract[English] A catalyst article for treating exhaust gas comprising: a substrate comprising an inlet end, an outlet end with an axial length L; a first catalytic region comprising a first palladium component; a second catalytic region comprising a second rhodium component; a third catalytic region comprising a third palladium component; wherein the first catalytic region is adjacent to the second catalytic region; and wherein the first palladium component and the second rhodium component have a weight ratio of from 3:1 to 19:1, based on element.[French] L'invention concerne un article catalyseur pour le traitement de gaz d'échappement comprenant : un substrat comprenant une extrémité d'entrée, une extrémité de sortie présentant une longueur axiale L ; une première région catalytique comprenant un premier composant de palladium ; une seconde région catalytique comprenant un second composant de rhodium ; une troisième région catalytique comprenant un troisième composant de palladium ; la première région catalytique étant adjacente à la seconde région catalytique ; et le premier composant de palladium et le second composant de rhodium présentant un rapport pondéral de 3:1 à 19:1, sur la base de l'élément.