WO2026117430 - HIGH EFFICIENCY PLASMA SOURCE FOR PLASMA PROCESSING
National phase entry is expected:
Publication Number
WO/2026/117430
Publication Date
04.06.2026
International Application No.
PCT/US2025/056292
International Filing Date
20.11.2025
Title **
[English]
HIGH EFFICIENCY PLASMA SOURCE FOR PLASMA PROCESSING
[French]
SOURCE DE PLASMA À HAUT RENDEMENT POUR TRAITEMENT AU PLASMA
Applicants **
NAGORNY, Vladimir
Inventors
NAGORNY, Vladimir
Priority Data
63/725,453
26.11.2024
US
Application details
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International Searching Authority |
USPTO
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| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
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| Type of Assignment |
The Standard Agent's Assignment
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| Applicant's Legal Status |
Natural Person
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| * | |
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| Entry into National Phase under |
Chapter I
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| Patent Delivery |
Send the Letters Patent by Courier
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| Translation |
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* The data is based on automatic recognition. Please verify and amend if necessary.
** IP-Coster compiles data from publicly available sources. If this data includes your personal information, you can contact us to request its removal.
Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 2244 | |
| EPO | Filing, Examination, Granting | 10528 | |
| Japan | Filing, Examination, Granting | 2327 | |
| South Korea | Filing, Examination, Granting | 2442 | |
| USA | Filing, Examination, Granting | 4910 |
Total:
22,451
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Abstract[English]
A plasma source for plasma treatment is disclosed. The source includes a gas injection insert defining a plasma source interior volume and a plasma generation region or active region with enhanced electron confinement between the chamber wall and the insert. The source includes a pair of induction coils disposed around the active region. The gas injection insert includes a first set of gas injection ports at the top of the active region above the top coil and the second set of gas injection ports disposed in the lower half of the active between the first and the second induction coils. In at least one embodiment the first feed gas entering the active region through the first gas injection inlet is a noble gas and the second feed gas injected into the active region through the second gas injection inlet is one of the processing gases.[French]
L'invention divulgue une source de plasma pour le traitement au plasma. La source comporte un insert d'injection de gaz délimitant un volume intérieur de source de plasma et une région de génération de plasma ou région active avec un confinement d'électrons amélioré entre la paroi de chambre et l'insert. La source comporte une paire de bobines d'induction disposées autour de la région active. L'insert d'injection de gaz comporte un premier ensemble d'orifices d'injection de gaz au sommet de la région active au-dessus de la bobine supérieure et le second ensemble d'orifices d'injection de gaz disposés dans la moitié inférieure de la région active entre les première et seconde bobines d'induction. Dans au moins un mode de réalisation, le premier gaz d'alimentation entrant dans la région active à travers la première entrée d'injection de gaz est un gaz noble et le second gaz d'alimentation injecté dans la région active à travers la seconde entrée d'injection de gaz est l'un des gaz de traitement.