WO2024172753 - SILICON PHOTONIC DEVICE FOR GAS MONITORING
National phase entry is expected:
Publication Number
WO/2024/172753
Publication Date
22.08.2024
International Application No.
PCT/SG2023/050082
International Filing Date
14.02.2023
Title **
[English]
SILICON PHOTONIC DEVICE FOR GAS MONITORING
[French]
DISPOSITIF PHOTONIQUE AU SILICIUM POUR LA SURVEILLANCE DE GAZ
Applicants **
COMPOUNDTEK PTE. LTD.
NANYANG TECHNOLOGICAL UNIVERSITY
Inventors
BRIAN SIA, Jia Xu
WANG, Hong
ANG, Kian Siong
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
| Number of Priorities | * |
| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
| Pages for Publication | * |
| Number of Pages with Drawings | * |
| Pages of Specification | * |
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| Number of Office Actions | * |
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International Searching Authority |
MOIP
* |
| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
* |
| Type of Assignment |
The Standard Agent's Assignment
* |
| Applicant's Legal Status |
Legal Entity
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| * | |
| * | |
| * | |
| * | |
| * | |
| Entry into National Phase under |
Chapter I
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| Patent Delivery |
Send the Letters Patent by Courier
* |
| Translation |
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* The data is based on automatic recognition. Please verify and amend if necessary.
** IP-Coster compiles data from publicly available sources. If this data includes your personal information, you can contact us to request its removal.
Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 1885 | |
| EPO | Filing, Examination, Granting | 11708 | |
| Japan | Filing, Examination, Granting | 2009 | |
| South Korea | Filing, Examination, Granting | 1310 | |
| USA | Filing, Examination, Granting | 4740 |
Total:
21,652
The term for entry into the National Phase has expired. This quotation is for informational purposes only
Abstract[English]
The present invention relates to a system (100) for gas monitoring. The system (100) comprises a substrate and a silicon photonic device e.g. chip-scale gas spectrometer, fabricated on the substrate for generating two lightwaves. At least one light path (70a, 70b) is provided for propagating each lightwave from the silicon photonic device. A first light path (70a) includes a sensing waveguide section (71) exposed to an environment to be monitored and a second light path (70b) is isolated from the environment. At least one light sensor (60a, 60b) at an exit end of each light path (70a, 70b) senses the corresponding lightwave. An analyzing unit (80) analyzes sensor outputs to detect presence, type and/or concentration of a gas in the environment.[French]
La présente invention concerne un système (100) de surveillance de gaz. Le système (100) comprend un substrat et un dispositif photonique au silicium, par exemple un spectromètre à gaz à l'échelle d'une puce, fabriqué sur le substrat pour générer deux ondes lumineuses. Au moins un trajet de lumière (70a, 70b) est prévu pour propager chaque onde lumineuse depuis le dispositif photonique au silicium. Un premier trajet de lumière (70a) comprend une section de guide d'ondes de détection (71) exposée à un environnement à surveiller et un second trajet de lumière (70b) est isolé de l'environnement. Au moins un capteur de lumière (60a, 60b) au niveau d'une extrémité de sortie de chaque trajet de lumière (70a, 70b) détecte l'onde lumineuse correspondante. Une unité d'analyse (80) analyse des sorties de capteur pour détecter la présence, le type et/ou la concentration d'un gaz dans l'environnement.