WO2026120533 - ORGANOMETALLIC COMPOUNDS, METHODS OF SYNTHESIZING ORGANOMETALLIC COMPOUNDS, AND METHODS OF DEPOSITING METAL OXIDE FILMS AND METAL NITRIDE FILMS
National phase entry is expected:
Publication Number
WO/2026/120533
Publication Date
11.06.2026
International Application No.
PCT/IB2025/062433
International Filing Date
04.12.2025
Title **
[English]
ORGANOMETALLIC COMPOUNDS, METHODS OF SYNTHESIZING ORGANOMETALLIC COMPOUNDS, AND METHODS OF DEPOSITING METAL OXIDE FILMS AND METAL NITRIDE FILMS
[French]
COMPOSÉS ORGANOMÉTALLIQUES, PROCÉDÉS DE SYNTHÈSE DE COMPOSÉS ORGANOMÉTALLIQUES ET PROCÉDÉS DE DÉPÔT DE FILMS D'OXYDE MÉTALLIQUE ET DE FILMS DE NITRURE MÉTALLIQUE
Applicants **
SEASTAR CHEMICALS ULC
Inventors
CEMBELLA, Shaun
FABULYAK, Diana
CONOVER, Cassidy
CAMPBELL, Collin
GRAFF, Wesley
Priority Data
63/728,333
05.12.2024
US
Application details
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International Searching Authority |
CIPO
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| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
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| Type of Assignment |
The Standard Agent's Assignment
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| Applicant's Legal Status |
Legal Entity
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| Entry into National Phase under |
Chapter I
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| Patent Delivery |
Send the Letters Patent by Courier
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| Translation |
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Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 2500 | |
| EPO | Filing, Examination, Granting | 17999 | |
| Japan | Filing, Examination, Granting | 2545 | |
| South Korea | Filing, Examination, Granting | 2909 | |
| USA | Filing, Examination, Granting | 12140 |
Total:
38,093
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Abstract[English]
Disclosed herein are organometallic compounds including monomeric alkoxyaminosilane complexes and dimeric alkoxyaminosilane complexes useful as precursors for metal oxide and metal nitride vapor phase deposition. Additionally, disclosed herein are methods for synthesizing these organometallic compounds and methods for forming metal oxide films and metal nitride films by vapor phase deposition using these organometallic compounds.[French]
L'invention concerne des composés organométalliques comprenant des complexes alcoxyaminosilane monomères et des complexes alcoxyaminosilane dimères utiles en tant que précurseurs pour le dépôt en phase vapeur d'oxyde métallique et de nitrure métallique. De plus, l'invention concerne des procédés de synthèse de ces composés organométalliques et des procédés de formation de films d'oxyde métallique et de films de nitrure métallique par dépôt en phase vapeur à l'aide de ces composés organométalliques.