WO2026110065 - AN IMPROVED ELECTROCATALYST AND METHOD OF FORMING THE SAME
National phase entry is expected:
Publication Number
WO/2026/110065
Publication Date
28.05.2026
International Application No.
PCT/IB2025/061882
International Filing Date
20.11.2025
Title **
[English]
AN IMPROVED ELECTROCATALYST AND METHOD OF FORMING THE SAME
[French]
ÉLECTROCATALYSEUR AMÉLIORÉ ET SON PROCÉDÉ DE FORMATION
Applicants **
KING ABDULLAH UNIVERSITY OF SCIENCE AND TECHNOLOGY
Inventors
ZHANG, Huabin
LI, Yang
Priority Data
63/723,778
22.11.2024
US
Application details
| Total Number of Claims/PCT | * |
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International Searching Authority |
MOIP
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| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
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| Type of Assignment |
The Standard Agent's Assignment
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| Applicant's Legal Status |
Legal Entity
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| Entry into National Phase under |
Chapter I
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| Patent Delivery |
Send the Letters Patent by Courier
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| Translation |
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* The data is based on automatic recognition. Please verify and amend if necessary.
** IP-Coster compiles data from publicly available sources. If this data includes your personal information, you can contact us to request its removal.
Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 2276 | |
| EPO | Filing, Examination, Granting | 13426 | |
| Japan | Filing, Examination, Granting | 2264 | |
| South Korea | Filing, Examination, Granting | 1781 | |
| USA | Filing, Examination, Granting | 4740 |

Total:
24,487
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Abstract[English]
An improved electrocatalyst and method of forming the same There is provided an electrocatalyst, comprising a platinum group metal (PGM) doped within a substrate comprising a transition metal oxide, wherein inter-atom spacing of the PGM within the substrate is > 0 nm and ≤ 0.4 nm. There is also provided a method of forming the electrocatalyst.[French]
Électrocatalyseur amélioré et son procédé de formation. L'invention concerne un électrocatalyseur, comprenant un métal du groupe du platine (PGM) dopé à l'intérieur d'un substrat comprenant un oxyde de métal de transition, l'espacement entre atomes du PGM à l'intérieur du substrat étant > 0 nm et ≤ 0,4 nm. L'invention concerne également un procédé de formation de l'électrocatalyseur.