WO2025253317 - GANTRY SYSTEM FOR APPLYING MASKS
National phase entry is expected:
Publication Number
WO/2025/253317
Publication Date
11.12.2025
International Application No.
PCT/IB2025/055770
International Filing Date
04.06.2025
Title **
[English]
GANTRY SYSTEM FOR APPLYING MASKS
[French]
SYSTÈME DE PORTIQUE POUR APPLIQUER DES MASQUES
Applicants **
VITRO FABRICACIÓN DE MÁQUINAS, S.A. DE C.V.
Inventors
MACOUZET DÍAZ LEAL, Adrián Enrique
CHAVEZ GUERRERO, Gustavo, Abraham
Priority Data
63/655,835
04.06.2024
US
19/226,968
03.06.2025
US
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
| Number of Priorities | * |
| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
| Pages for Publication | * |
| Number of Pages with Drawings | * |
| Pages of Specification | * |
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| Number of Office Actions | * |
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International Searching Authority |
EPO
* |
| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
* |
| Type of Assignment |
The Standard Agent's Assignment
* |
| Applicant's Legal Status |
Legal Entity
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| * | |
| * | |
| * | |
| * | |
| * | |
| Entry into National Phase under |
Chapter I
* |
| Patent Delivery |
Send the Letters Patent by Courier
* |
| Translation |
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* The data is based on automatic recognition. Please verify and amend if necessary.
** IP-Coster compiles data from publicly available sources. If this data includes your personal information, you can contact us to request its removal.
Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 2160 | |
| EPO | Filing, Examination, Granting | 8387 | |
| Japan | Filing, Examination, Granting | 2171 | |
| South Korea | Filing, Examination, Granting | 2076 | |
| USA | Filing, Examination, Granting | 4740 |
Total:
19,534
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Abstract[English]
A method for masking substrates includes: providing a substrate including a first surface and an opposing second surface, the substrate having a first substrate identity from a plurality of substrate identities; automatically detecting, with at least one processor, that the substrate has the first substrate identity; in response to detecting that the substrate has the first substrate identity, determining, with at least one processor, a first mask of a plurality of masks associated with the first substrate identity based on associations stored in a database between the plurality of substrate identities and the plurality of masks; in response to determining the first mask, automatically retrieving, with at least one mechanical arm, the first mask; and placing, with the at least one mechanical arm, the first mask over the first surface.[French]
L'invention concerne un procédé de masquage de substrats consistant à : fournir un substrat comprenant une première surface et une seconde surface opposée, le substrat ayant une première identité de substrat parmi une pluralité d'identités de substrat ; détecter automatiquement, à l'aide d'au moins un processeur, que le substrat a la première identité de substrat ; en réponse à la détection du fait que le substrat a la première identité de substrat, déterminer, à l'aide d'au moins un processeur, un premier masque d'une pluralité de masques associés à la première identité de substrat sur la base d'associations stockées dans une base de données entre la pluralité d'identités de substrat et la pluralité de masques ; en réponse à la détermination du premier masque, récupérer automatiquement, à l'aide d'au moins un bras mécanique, le premier masque ; et placer, à l'aide du ou des bras mécaniques, le premier masque sur la première surface.