WO2024126052 - COPOLYMER AND HOT MELT MATERIALS COMPRISING SAID COPOLYMER
National phase entry is expected:
Publication Number
WO/2024/126052
Publication Date
20.06.2024
International Application No.
PCT/EP2023/083577
International Filing Date
29.11.2023
Title **
[English]
COPOLYMER AND HOT MELT MATERIALS COMPRISING SAID COPOLYMER
[French]
COPOLYMÈRE ET MATÉRIAUX THERMOFUSIBLES COMPRENANT LEDIT COPOLYMÈRE
Applicants **
HENKEL AG & CO. KGAA
Inventors
ARNOLD, Moritz
TADEN, Andreas
SCHNEIDER, Anja
ROSCHKOWSKI, Thomas
Priority Data
22214076.6
16.12.2022
EP
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
| Number of Priorities | * |
| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
| Pages for Publication | * |
| Number of Pages with Drawings | * |
| Pages of Specification | * |
| * | |
| Number of Office Actions | * |
| * | |
International Searching Authority |
EPO
* |
| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
* |
| Type of Assignment |
The Standard Agent's Assignment
* |
| Applicant's Legal Status |
Legal Entity
* |
| * | |
| * | |
| * | |
| * | |
| * | |
| Entry into National Phase under |
Chapter I
* |
| Patent Delivery |
Send the Letters Patent by Courier
* |
| Translation |
|
* The data is based on automatic recognition. Please verify and amend if necessary.
** IP-Coster compiles data from publicly available sources. If this data includes your personal information, you can contact us to request its removal.
Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 2165 | |
| EPO | Filing, Examination, Granting | 9465 | |
| Japan | Filing, Examination, Granting | 2232 | |
| South Korea | Filing, Examination, Granting | 2185 | |
| USA | Filing, Examination, Granting | 5940 |
Total:
21,987
The term for entry into the National Phase has expired. This quotation is for informational purposes only
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Abstract[English]
are a radical possessing ethylenic unsaturation, wherein j is an integer of from 1 to 3, preferably 1 or 2; and, from 90 to 99.9 wt.% of b) at least one ethylenically unsaturated non-ionic monomer which does not bear an epoxide group or a moiety decomposable under photo-irradiation to form a radical.[French]
soient un radical possédant une insaturation éthylénique, j étant un nombre entier de 1 à 3, de préférence 1 ou 2 ; et 90 à 99,9 % en poids de b) au moins un monomère non ionique éthyléniquement insaturé qui ne porte pas de groupe époxyde ou de fragment décomposable sous photo-irradiation pour former un radical.