WO2023222740 - SUBSTRATE COATING RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST PATTERN
National phase entry:
Publication Number
WO/2023/222740
Publication Date
23.11.2023
International Application No.
PCT/EP2023/063208
International Filing Date
17.05.2023
Title **
[English]
SUBSTRATE COATING RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST PATTERN
[French]
COMPOSITION DE RÉSERVE DE REVÊTEMENT DE SUBSTRAT ET PROCÉDÉ DE FABRICATION DE MOTIF DE RÉSERVE
Applicants **
MERCK PATENT GMBH
Inventors
KUBO, Masahiko
TAKAICHI, Tetsumasa
Priority Data
2022-083034
20.05.2022
JP
2022-133626
24.08.2022
JP
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
| Number of Priorities | * |
| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
| Pages for Publication | * |
| Number of Pages with Drawings | * |
| Pages of Specification | * |
| * | |
| Number of Office Actions | * |
| * | |
International Searching Authority |
EPO
* |
| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
* |
| Type of Assignment |
The Standard Agent's Assignment
* |
| Applicant's Legal Status |
Legal Entity
* |
| * | |
| * | |
| * | |
| * | |
| * | |
| Entry into National Phase under |
Chapter I
* |
| Patent Delivery |
Send the Letters Patent by Courier
* |
| Translation |
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* The data is based on automatic recognition. Please verify and amend if necessary.
** IP-Coster compiles data from publicly available sources. If this data includes your personal information, you can contact us to request its removal.
Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 1210 | |
| EPO | Filing, Examination, Granting | 7979 | |
| Japan | Filing, Examination, Granting | 1621 | |
| South Korea | Filing, Examination, Granting | 1125 | |
| USA | Filing, Examination, Granting | 3490 |
Total:
15,425
The term for entry into the National Phase has expired. This quotation is for informational purposes only
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Abstract[English]
Provided is a substrate coating resist composition containing a polymer (A) having a specific structure and a photoacid generator (B) having a specific structure.[French]
L'invention concerne une composition de réserve de revêtement de substrat contenant un polymère (A) ayant une structure spécifique et un photogénérateur d'acides (B) ayant une structure spécifique.