WO2023170021 - ELECTRONIC DEVICE MANUFACTURING SOLUTION, METHOD FOR MANUFACTURING RESIST PATTERN, AND METHOD FOR MANUFACTURING DEVICE
National phase entry:
Publication Number
WO/2023/170021
Publication Date
14.09.2023
International Application No.
PCT/EP2023/055662
International Filing Date
07.03.2023
Title **
[English]
ELECTRONIC DEVICE MANUFACTURING SOLUTION, METHOD FOR MANUFACTURING RESIST PATTERN, AND METHOD FOR MANUFACTURING DEVICE
[French]
SOLUTION DE FABRICATION DE DISPOSITIF ÉLECTRONIQUE, PROCÉDÉ DE FABRICATION DE MOTIF DE RÉSERVE ET PROCÉDÉ DE FABRICATION DE DISPOSITIF
Applicants **
MERCK PATENT GMBH
Inventors
YAMAMOTO, Kazuma
YASHIMA, Tomoyasu
ISHII, Maki
YANAGITA, Hiroshi
Priority Data
2022-036381
09.03.2022
JP
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
| Number of Priorities | * |
| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
| Pages for Publication | * |
| Number of Pages with Drawings | * |
| Pages of Specification | * |
| * | |
| Number of Office Actions | * |
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International Searching Authority |
EPO
* |
| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
* |
| Type of Assignment |
The Standard Agent's Assignment
* |
| Applicant's Legal Status |
Legal Entity
* |
| * | |
| * | |
| * | |
| * | |
| * | |
| Entry into National Phase under |
Chapter I
* |
| Patent Delivery |
Send the Letters Patent by Courier
* |
| Translation |
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* The data is based on automatic recognition. Please verify and amend if necessary.
** IP-Coster compiles data from publicly available sources. If this data includes your personal information, you can contact us to request its removal.
Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 2019 | |
| EPO | Filing, Examination, Granting | 8344 | |
| Japan | Filing, Examination, Granting | 2110 | |
| South Korea | Filing, Examination, Granting | 1933 | |
| USA | Filing, Examination, Granting | 4740 |
Total:
19,146
The term for entry into the National Phase has expired. This quotation is for informational purposes only
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Abstract[English]
Provided are an electronic device manufacturing solution, a method for manufacturing a resist pattern, and a method for manufacturing a device.[French]
L'invention concerne une solution de fabrication de dispositif électronique, un procédé de fabrication de motif de réserve et un procédé de fabrication de dispositif.