WO2025102332 - ARRAY SUBSTRATE AND DISPLAY APPARATUS
National phase entry is expected:
Publication Number
WO/2025/102332
Publication Date
22.05.2025
International Application No.
PCT/CN2023/132222
International Filing Date
17.11.2023
Title **
[English]
ARRAY SUBSTRATE AND DISPLAY APPARATUS
[French]
SUBSTRAT MATRICIEL ET APPAREIL D'AFFICHAGE
Applicants **
BOE TECHNOLOGY GROUP CO., LTD.
CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
Inventors
FAN, Cong
ZHANG, Wei
XU, Guanghua
WANG, Hongli
Application details
| Total Number of Claims/PCT | * |
| Number of Independent Claims | * |
| Number of Priorities | * |
| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
| Pages for Publication | * |
| Number of Pages with Drawings | * |
| Pages of Specification | * |
| * | |
| Number of Office Actions | * |
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International Searching Authority |
CNIPA
* |
| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
* |
| Type of Assignment |
The Standard Agent's Assignment
* |
| Applicant's Legal Status |
Legal Entity
* |
| * | |
| * | |
| * | |
| * | |
| * | |
| Entry into National Phase under |
Chapter I
* |
| Patent Delivery |
Send the Letters Patent by Courier
* |
| Translation |
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* The data is based on automatic recognition. Please verify and amend if necessary.
** IP-Coster compiles data from publicly available sources. If this data includes your personal information, you can contact us to request its removal.
Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 2836 | |
| EPO | Filing, Examination, Granting | 18578 | |
| Japan | Filing, Examination, Granting | 2357 | |
| South Korea | Filing, Examination, Granting | 2405 | |
| USA | Filing, Examination, Granting | 5840 |
Total:
32,016
The term for entry into the National Phase has expired. This quotation is for informational purposes only
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Abstract[English]
An array substrate is provided. The array substrate includes a planarization layer; a partition layer on the planarization layer; an anode layer on a side of the partition layer away from the planarization layer; a pixel definition layer on a side of the anode layer away from the planarization layer; a spacer layer on a side of the pixel definition layer away from the planarization layer; and a plurality of partition grooves extending through the pixel definition layer. An orthographic projection of the partition layer on a base substrate at least partially overlaps with an orthographic projection of the anode layer on the base substrate. The orthographic projection of the partition layer on the base substrate at least partially overlaps with, and is at least partially non-overlapping with, an orthographic projection of a respective partition groove of the plurality of partition grooves on the base substrate.[French]
L'invention propose un substrat matriciel. Le substrat matriciel comprend une couche de planarisation ; une couche de séparation sur la couche de planarisation ; une couche d'anode sur un côté de la couche de séparation à l'opposé de la couche de planarisation ; une couche de définition de pixels sur un côté de la couche d'anode à l'opposé de la couche de planarisation ; une couche d'espacement sur un côté de la couche de définition de pixels à l'opposé de la couche de planarisation ; et une pluralité de rainures de séparation s'étendant à travers la couche de définition de pixels. Une projection orthographique de la couche de séparation sur un substrat de base chevauche au moins partiellement une projection orthographique de la couche d'anode sur le substrat de base. La projection orthographique de la couche de séparation sur le substrat de base chevauche au moins partiellement, et est au moins partiellement non chevauchante avec, une projection orthographique d'une rainure de séparation respective de la pluralité de rainures de séparation sur le substrat de base.