WO2025015549 - DESIGNS AND METHODS FOR MAUFACTURING OUT-OF-PLANE ROTATION STOPS FOR MEMS DEVICES
National phase entry:
Publication Number
WO/2025/015549
Publication Date
23.01.2025
International Application No.
PCT/CN2023/108074
International Filing Date
19.07.2023
Title **
[English]
DESIGNS AND METHODS FOR MAUFACTURING OUT-OF-PLANE ROTATION STOPS FOR MEMS DEVICES
[French]
CONCEPTIONS ET PROCÉDÉS DE FABRICATION DE BUTÉES DE ROTATION HORS PLAN POUR DISPOSITIFS MEMS
Applicants **
HUAWEI TECHNOLOGIES CO., LTD.
Inventors
MCNIE, Mark
YANG, Pin
Application details
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International Searching Authority |
CNIPA
* |
| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
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| Type of Assignment |
The Standard Agent's Assignment
* |
| Applicant's Legal Status |
Legal Entity
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| * | |
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| Entry into National Phase under |
Chapter I
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| Patent Delivery |
Send the Letters Patent by Courier
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| Translation |
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Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 2070 | |
| EPO | Filing, Examination, Granting | 15663 | |
| Japan | Filing, Examination, Granting | 2368 | |
| South Korea | Filing, Examination, Granting | 2405 | |
| USA | Filing, Examination, Granting | 4940 |
Total:
27,446
The term for entry into the National Phase has expired. This quotation is for informational purposes only
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Abstract[English]
A MEMS device (500) comprising a stop (502) for limiting the rotational motion of the rotor (104), the stop (502) positioned such that on rotation of the rotor (104) about its axis (AA) the first point of contact is between a surface of the stop (502) facing away from the axis (AA) and a surface of the rotor (104) facing towards the axis (AA). A method of manufacturing a MEMS device (900) comprising etching into a first layer to form the stator structure (910, 1110) and at least one stop (914, 1114), where the stop (914, 1114) comprises a trench formed by aspect ratio-dependent etching with walls bounding a landing site at the base of the trench, the stop (914, 1114) is formed a distance away from an axis (AA) of rotation of a rotor (904) such that on rotation of the rotor (904) about its axis (AA) the base of the trench is contacted by the rotor (904) before any other features of the device (900). Another MEMS device (1602) comprising at least two rotor portions (1604, 1606) arranged to rotate around respective axes (AA, BB), and at least one of a first stop type (1618) and at least one of a second stop type (1616).[French]
Un dispositif MEMS (500) comprend une butée (502) pour limiter le mouvement de rotation du rotor (104), la butée (502) étant positionnée de sorte que, lorsque le rotor (104) tourne autour de son axe (AA), le premier point de contact se situe entre une surface de la butée (502) opposée à l'axe (AA) et une surface du rotor (104) faisant face à l'axe (AA). L'invention concerne un procédé de fabrication d'un dispositif MEMS (900) consitant à : graver une première couche pour former la structure de stator (910, 1110) et au moins une butée (914, 1114), la butée (914, 1114) comprenant une tranchée formée par gravure dépendant du rapport d'aspect et comportant des parois délimitant un site de réception à la base de la tranchée, la butée (914, 1114) étant formée à une certaine distance d'un axe (AA) de rotation d'un rotor (904), de sorte que lorsque le rotor (904) tourne autour de son axe (AA), la base de la tranchée est touchée par le rotor (904) avant toute autre caractéristique du dispositif (900). Un autre dispositif MEMS (1602) comprend au moins deux parties de rotor (1604, 1606) conçues pour tourner autour d'axes respectifs (AA, BB), et au moins un premier type de butée (1618) et/ou au moins un second type de butée (1616).