WO2023108545 - METHOD FOR CONSTRUCTING DEFECT DETECTION MODEL OF MICRO LED ARRAY PANEL, APPARATURES FOR DECTECTIG PIXEL DEFECT AND DEVICES
National phase entry:
Publication Number
WO/2023/108545
Publication Date
22.06.2023
International Application No.
PCT/CN2021/138833
International Filing Date
16.12.2021
Title **
[English]
METHOD FOR CONSTRUCTING DEFECT DETECTION MODEL OF MICRO LED ARRAY PANEL, APPARATURES FOR DECTECTIG PIXEL DEFECT AND DEVICES
[French]
PROCÉDÉ DE CONSTRUCTION DE MODÈLE DE DÉTECTION DE DÉFAUT D'UN ÉCRAN DE RÉSEAU À MICRO-DEL, APPAREILS DE DÉTECTION DE DÉFAUT DE PIXEL ET DISPOSITIFS
Applicants **
JADE BIRD DISPLAY (SHANGHAI) LIMITED
Inventors
XU, Chenchao
YUE, Yang
LI, Qiming
Application details
| Total Number of Claims/PCT | * |
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| Number of Multi-Dependent Claims | * |
| Number of Drawings | * |
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International Searching Authority |
CNIPA
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| Recordal of a Change of the Applicant's Name/Address |
Change of Applicant's Name and Address
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| Type of Assignment |
The Standard Agent's Assignment
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| Applicant's Legal Status |
Legal Entity
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| Entry into National Phase under |
Chapter I
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| Patent Delivery |
Send the Letters Patent by Courier
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| Translation |
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Quotation for National Phase entry
| Country | Stages | Total | |
|---|---|---|---|
| China | Filing, Examination, Granting | 1895 | |
| EPO | Filing, Examination, Granting | 15540 | |
| Japan | Filing, Examination, Granting | 2557 | |
| South Korea | Filing, Examination, Granting | 2715 | |
| USA | Filing, Examination, Granting | 5940 |
Total:
28,647
The term for entry into the National Phase has expired. This quotation is for informational purposes only
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Abstract[English]
A method for constructing a defect detection model of a micro LED array is provided. The method at least comprises acquiring multiple part-pattern images of the micro LED array by multiple exposure processes, wherein, each exposure process obtains one part-pattern image of the micro LED array; and, the multiple part-pattern images together form a whole micro LED array image.[French]
L'invention concerne un procédé de construction d'un modèle de détection de défaut d'un réseau à micro-DEL. Le procédé comprend au moins l'acquisition de multiples images à motif partiel du réseau à micro-DEL par de multiples processus d'exposition, chaque processus d'exposition obtenant une image à motif partiel du réseau à micro-DEL ; et, les multiples images à motif partiel formant ensemble une image de réseau à micro-DEL entière.